McLantis Technology (Shanghai) Ltd. is committed to becoming China's innovation force in laser direct imaging and maskless lithography, delivering high-end equipment and digital solutions to global customers.
McLantis Technology (Shanghai) Ltd. focuses on R&D, manufacturing and system integration of Laser Direct Imaging (LDI), Computer-to-Screen (CTS) and maskless lithography equipment, serving printing, PCB, semiconductor, automotive electronics and security printing.
The company has built a complete in-house R&D system covering optical design, motion control and algorithm software, holding 8 utility-model patents and 11 software copyrights, and has won 17+ national and provincial honors.
From a technology-driven startup to a global footprint, McLantis advances steadily (years are indicative, please verify before launch).
Company founded, establishing direction in LDI and maskless lithography.
First LDI direct-writing lithography system delivered, entering high-end PCB market.
Patent portfolio took shape; MIGAS software stack R&D initiated.
MIGAS digital workflow fully deployed; software copyrights exceeded 11.
Awarded at Maker China Hong Kong, accelerating brand internationalization.
Planning global expansion, exhibiting at ExpoPrint Latin America 2026 and other shows.
To become a globally leading Chinese brand in laser direct-writing and precision lithography equipment, serving the world's manufacturing industry with light-as-pen intelligent manufacturing.
With proprietary core technologies, create higher-precision, higher-efficiency and lower-cost precision manufacturing value for our customers.
Converging composite talents in optics, software, control and process, with a complete R&D and manufacturing system.
With Shanghai HQ as the hub, McLantis deploys R&D, manufacturing and demonstration bases across East China, building a collaborative industrial network.

PCB exposure equipment manufacturing base, undertaking LDI direct-writing lithography equipment production and supply-chain coordination.

Automotive lithography R&D center, focusing on further R&D and process iteration of maskless direct-writing lithography equipment.

Lithography material manufacturing base, undertaking localized production of photoresist and supporting process materials.